i-ray exposure stepper (Canon inc)

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Canon inc i-ray exposure stepper
I Ray Exposure Stepper, supplied by Canon inc, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/i-ray+stepper/i+ray+exposure+stepper/us12326662-190-36-41
Average 90 stars, based on 1 article reviews

i-ray exposure stepper - by Bioz Stars, 2026-10

90/100 stars

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Article Title: Colored composition, method of producing color filter using the same, color filter and solid-state imaging device
Article Snippet: The blue color radiation-sensitive layer of the stacked color filter thus-obtained was subjected to pattern exposure using an i-ray stepper (produced by Canon Inc.) in an exposure amount of 350 mJ/cm².

Article Title: Coloring composition, cured film, color filter, method for manufacturing color filter, solid-state imaging device, image display device, organic electroluminescent element, colorant, and method for producing colorant
Article Snippet: Subsequently, the photoresist layer was patternwise exposed at an exposure dose of 350 mJ/cm²using an i-ray stepper (manufactured by Canon Inc.), and then subjected to a heating treatment for 1 minute at the temperature of the photoresist layer or an atmospheric temperature reaching 90° C. Thereafter, the resultant was subjected to a developing treatment with a developing solution “FHD-5” (manufactured by FUJIFILM Electronic Materials Co., Ltd.) for 1 minute, and then subjected to a postbaking treatment at 110° C. for 1 minute to form a resist pattern.

Article Title: Coloring composition, color filter, pattern forming method, solid-state imaging device, and image display device
Article Snippet: A developing treatment was carried out with a developer “FHD-5” (manufactured by Fujifilm Electronics Materials Co., Ltd.) for 1 minute, and then subjected to a post-baking treatment at 110° C. for 1 minute to form a resist pattern.

Article Title: Colored composition, cured film, color filter, color-filter manufacturing method, solid-state imaging element, image display device, polymer, and xanthene dye
Article Snippet: Thereafter, a developing treatment was carried out for 1 minute with a developer “FHD-5” (manufactured by FUJIFILM Electronic Materials Co., Ltd.) and further subjected to a post-baking treatment at 110° C. for 1 minute to form a resist pattern.

Article Title: Coloring composition, cured film, color filter, method of manufacturing color filter, solid image pickup element, and image display apparatus
Article Snippet: Next, using a i-ray stepper (manufactured by Canon Corporation) the photoresist layer was exposed to form a pattern at an exposure intensity of 350 mJ/cm²and was heated for 1 minute at a temperature where the temperature of the photoresist layer or the atmosphere temperature was 90° C. Next, the photoresist layer was developed using a developer “FHD-5” (manufactured by Fujifilm Electronic Materials Co., Ltd.) for 1 minute and was further post-baked at 110° C. for 1 minute to form a resist pattern.

Article Title: Colored composition, method of producing color filter using the same, color filter and solid-state imaging device
Article Snippet: The red color radiation-sensitive layer of the stacked color filter thus-obtained was subjected to pattern exposure using an i-ray stepper (produced by Canon Inc.) in an exposure amount of 350 mJ/cm².

Article Title: Composition, film, dry film, pattern forming method, near-infrared transmitting filter, structure, optical sensor, and image display device
Article Snippet: Subsequently, the photoresist layer was subjected to patternwise exposure using an i-ray stepper (manufactured by Canon Inc.) with an exposure dose of 200 mJ/cm², and then subjected to a heating treatment for 1 minute at a temperature so that the temperature of the photoresist layer or the ambient temperature was 90° C. Thereafter, the photoresist layer was subjected to a developing treatment for 1 minute using a developer “FHD-5” (manufactured by Fujifilm Electronics Materials Co., Ltd.) and a post-baking treatment was carried out at 110° C. for 1 minute to form a resist pattern.

Article Title: Structure, composition for near-infrared cut filter, dry film, method for producing structure, optical sensor, and image display device
Article Snippet: Subsequently, the photoresist layer was subjected to patternwise exposure using an i-ray stepper (manufactured by Canon Inc.) with an exposure dose of 200 mJ/cm2, and then subjected to a heating treatment for 1 minute at a temperature so that the temperature of the photoresist layer or the atmosphere temperature was 90° C. Thereafter, the photoresist layer was subjected to a developing treatment for 1 minute using a developer “FHD-5” (manufactured by Fujifilm Electronics Materials Co., Ltd.) and a post-baking treatment was carried out at 110° C. for 1 minute to form a resist pattern.

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